JPH0720914Y2 - 基板の表面処理装置 - Google Patents
基板の表面処理装置Info
- Publication number
- JPH0720914Y2 JPH0720914Y2 JP1990058570U JP5857090U JPH0720914Y2 JP H0720914 Y2 JPH0720914 Y2 JP H0720914Y2 JP 1990058570 U JP1990058570 U JP 1990058570U JP 5857090 U JP5857090 U JP 5857090U JP H0720914 Y2 JPH0720914 Y2 JP H0720914Y2
- Authority
- JP
- Japan
- Prior art keywords
- substrate
- treatment
- liquid
- nozzle
- processing liquid
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
- 239000000758 substrate Substances 0.000 title claims description 86
- 238000004381 surface treatment Methods 0.000 title claims description 27
- 239000007788 liquid Substances 0.000 claims description 112
- 238000012545 processing Methods 0.000 claims description 57
- 238000007599 discharging Methods 0.000 claims description 4
- 238000000034 method Methods 0.000 description 10
- 125000006850 spacer group Chemical group 0.000 description 5
- 239000012530 fluid Substances 0.000 description 4
- 239000003595 mist Substances 0.000 description 4
- 239000011651 chromium Substances 0.000 description 3
- 238000005530 etching Methods 0.000 description 3
- 239000011521 glass Substances 0.000 description 3
- 238000007654 immersion Methods 0.000 description 3
- 239000007921 spray Substances 0.000 description 3
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 description 2
- 229910052804 chromium Inorganic materials 0.000 description 2
- 238000004891 communication Methods 0.000 description 2
- 238000010586 diagram Methods 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 239000004973 liquid crystal related substance Substances 0.000 description 2
- 239000000243 solution Substances 0.000 description 2
- 238000012360 testing method Methods 0.000 description 2
- 206010041662 Splinter Diseases 0.000 description 1
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 1
- 238000004140 cleaning Methods 0.000 description 1
- 238000001514 detection method Methods 0.000 description 1
- 230000006866 deterioration Effects 0.000 description 1
- 238000011161 development Methods 0.000 description 1
- 238000002347 injection Methods 0.000 description 1
- 239000007924 injection Substances 0.000 description 1
- 229910052760 oxygen Inorganic materials 0.000 description 1
- 239000001301 oxygen Substances 0.000 description 1
- 238000011176 pooling Methods 0.000 description 1
- 230000003252 repetitive effect Effects 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
- 239000010409 thin film Substances 0.000 description 1
- 235000012431 wafers Nutrition 0.000 description 1
Landscapes
- ing And Chemical Polishing (AREA)
- Manufacturing Of Printed Circuit Boards (AREA)
- Weting (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP1990058570U JPH0720914Y2 (ja) | 1990-06-01 | 1990-06-01 | 基板の表面処理装置 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP1990058570U JPH0720914Y2 (ja) | 1990-06-01 | 1990-06-01 | 基板の表面処理装置 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPH0418434U JPH0418434U (en]) | 1992-02-17 |
| JPH0720914Y2 true JPH0720914Y2 (ja) | 1995-05-15 |
Family
ID=31584304
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP1990058570U Expired - Lifetime JPH0720914Y2 (ja) | 1990-06-01 | 1990-06-01 | 基板の表面処理装置 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH0720914Y2 (en]) |
Families Citing this family (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH0783167B2 (ja) * | 1992-12-24 | 1995-09-06 | 東京化工機株式会社 | 電着装置 |
| JP4602567B2 (ja) * | 2000-12-15 | 2010-12-22 | 芝浦メカトロニクス株式会社 | 基板の洗浄装置 |
| TWI226077B (en) * | 2001-07-05 | 2005-01-01 | Tokyo Electron Ltd | Liquid processing apparatus and liquid processing method |
| WO2003100842A1 (fr) * | 2002-05-23 | 2003-12-04 | Sumitomo Precision Products Co., Ltd | Dispositif de traitement de substrats equipe d'un mecanisme de transport |
| JP7451781B2 (ja) * | 2022-03-18 | 2024-03-18 | 芝浦メカトロニクス株式会社 | 基板処理装置 |
-
1990
- 1990-06-01 JP JP1990058570U patent/JPH0720914Y2/ja not_active Expired - Lifetime
Also Published As
| Publication number | Publication date |
|---|---|
| JPH0418434U (en]) | 1992-02-17 |
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